ambient density

The RTP temperature, the RTP time, the cooling rate, the ambient and the dopant atoms influenced the density and distribution of point defects in wafers, and then affected oxygen precipitates.

快速热处理温度、时间、降温速度、退火气氛、掺杂原子等都对硅片中点缺陷的形成及分布产生影响，进而影响氧沉淀的形成。

The measurements of the radio spikes with high time and frequency resolution by the spectrometer in Beijing Observatory may provide a self consistent diagnosis for the ambient plasma parameters ( magnetic field, density, temperature, wave vector, and the properties of nonthermal electrons).

利用北京天文台高时间和高频率分辨率的射电频谱仪对射电尖峰的测量，可以对背景等离子体参数进行的自洽诊断（磁场，密度，温度，波矢，及非热电子的性质）。